首页> 外国专利> SPACER FOR SPARK PLASMA SINTERING, SPARK PLASMA SINTERING DEVICE, AND SPARK PLASMA SINTERING METHOD

SPACER FOR SPARK PLASMA SINTERING, SPARK PLASMA SINTERING DEVICE, AND SPARK PLASMA SINTERING METHOD

机译:火花等离子烧结用间隔物,火花等离子烧结装置以及火花等离子烧结方法

摘要

Provided is a silicon carbide spacer which is capable of suppressing the occurrence of breakages due to spark plasma sintering to enable stable spark plasma sintering. This spacer for spark plasma sintering is a silicon carbide spacer 12 that includes silicon carbide and has a frustoconical shape. The silicon carbide spacer 12 is placed, in a spark plasma sintering device 1, between a punch 112 of a mold 11 for spark plasma sintering that has a cylinder 111 and the punch 112, and a pressurization ram 14 that applies pressure to the punch 112, with the small flat surface 21 of the frustoconical shape disposed on the punch 112 side. Additionally, the diameter (ds) of the small flat surface 21 is preferably configured such that the ratio thereof to the punch 112 diameter (a) satisfies the relationship 1≤ds/a≤1.5.
机译:提供一种碳化硅隔离物,其能够抑制由于火花等离子体烧结引起的破裂的发生,从而能够进行稳定的火花等离子体烧结。用于火花等离子体烧结的该间隔物是碳化硅间隔物12,其包括碳化硅并且具有截头圆锥形的形状。在火花等离子烧结装置1中,将碳化硅隔离物12放置在具有圆筒111和冲头112的用于火花等离子烧结的模具11的冲头112和对冲头112施加压力的加压柱塞14之间。截头圆锥形的小平面21位于冲头112侧。另外,小平面21的直径(d s )优选地被配置为使得其与冲头112直径(a)的比率满足关系1≤d s /a≤1.5。

著录项

  • 公开/公告号WO2018012332A1

    专利类型

  • 公开/公告日2018-01-18

    原文格式PDF

  • 申请/专利号WO2017JP24300

  • 发明设计人 NAKAMURA NOBUO;

    申请日2017-07-03

  • 分类号C04B35/645;B22F3/105;B22F3/14;B28B3;C04B35/569;

  • 国家 WO

  • 入库时间 2022-08-21 12:46:26

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