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MANUFACTURE METHOD OF LOW TEMPERATURE POLY-SILICON TFT SUBSTRATE AND LOW TEMPERATURE POLY-SILICON TFT SUBSTRATE

机译:低温多晶硅TFT基板的制造方法及低温多晶硅TFT基板的制造方法

摘要

The present invention provides a manufacture method of a Low Temperature Poly-silicon TFT substrate and a Low Temperature Poly-silicon TFT substrate, in which by locating one heat sink layer under the amorphous silicon layer in advance, the difference of the crystallizations of the polysilicons in the drive area and the display area can exist after implementing an Excimer Laser Annealing process to the amorphous silicon layer, and in the drive area, the polysilicon with the larger lattice dimension is formed to promote the electron mobility; the fractured crystals can be achieved in the crystallization process of the display area to form the polysilicon with the smaller lattice dimension for ensuring the uniformity of the grain boundary and raising the uniformity of the current, and thus, the electrical property demands for the different TFTs can be satisfied to raise the light uniformity of the OLED.
机译:本发明提供了一种低温多晶硅TFT基板和低温多晶硅TFT基板的制造方法,其中,通过预先在非晶硅层下方设置一个散热层,从而使多晶硅的结晶度的差异变大。对非晶硅层进行准分子激光退火后,可以在驱动区和显示区中存在,在驱动区中,形成较大晶格尺寸的多晶硅以促进电子迁移率。在显示区域的结晶过程中,可以得到断裂的晶体,形成晶格尺寸较小的多晶硅,以保证晶界的均匀性,提高电流的均匀性,因此,不同TFT的电性能要求可以满足以提高OLED的光均匀性。

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