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Sputtering target, method of manufacturing PVD film using the same, and method of controlling impurity concentration in PVD film
Sputtering target, method of manufacturing PVD film using the same, and method of controlling impurity concentration in PVD film
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机译：溅射靶，使用该靶的PVD膜的制造方法以及控制PVD膜中的杂质浓度的方法
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摘要
PROBLEM TO BE SOLVED: To provide a sputtering target for making it possible to form a PVD film of a concentration, in which the parent material of a sputtering target and an impurity are difficult to integrally mold, to make it feasible to manage an impurity and its density adjustment, and to make it possible to prevent the reduction of productivity.SOLUTION: A sputtering target 3 comprises a parent material target 30 having a target face and a specific thickness tand having a plurality of holes 300 for burying an impurity small part 31 or a mother material small part 32.SELECTED DRAWING: Figure 1
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