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SURFACE TREATMENT METHOD FOR DEPOSITION ACTIVATION OF DIELECTRIC THIN FILM ON GRAPHENE SURFACE TREATED GRAPHENE SUBSTRATE BY THE SAME AND ELECTRONIC DEVICE COMPRISING THE SURFACE TREATED GRAPHENE SUBSTRATE
SURFACE TREATMENT METHOD FOR DEPOSITION ACTIVATION OF DIELECTRIC THIN FILM ON GRAPHENE SURFACE TREATED GRAPHENE SUBSTRATE BY THE SAME AND ELECTRONIC DEVICE COMPRISING THE SURFACE TREATED GRAPHENE SUBSTRATE
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method for activating a graphene dielectric thin film deposition, a graphene substrate surface-treated by the method, and a graphene substrate surface-treated, The surface treatment method for activating the phase dielectric thin film deposition includes: forming an organic material on the inactive graphene to perform a surface treatment; And forming a dielectric thin film on the organic material.
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