首页> 外国专利> HALOGEN SURFACE-SUBSTITUTED NANOCRYSTAL QUANTUM DOTS, AND HALOGEN SURFACE SUBSTITUTION METHOD FOR SURFACE STABILIZATION OF NANOCRYSTAL QUANTUM DOTS

HALOGEN SURFACE-SUBSTITUTED NANOCRYSTAL QUANTUM DOTS, AND HALOGEN SURFACE SUBSTITUTION METHOD FOR SURFACE STABILIZATION OF NANOCRYSTAL QUANTUM DOTS

机译:卤代表面取代的纳米量子点和卤代表面取代方法用于纳米量子点的表面稳定化

摘要

The present invention relates to a halogen surface substitution method for surface stabilization of nanocrystal quantum dots, and nanocrystal quantum dots halogen surface-treated thereby. The method comprises: a step of preparing nanocrystal quantum dots in which an organic ligand is bound to the surface of a shell; a step of substituting the organic ligand with a halogen material by bringing the nanocrystal quantum dots into contact with a halogen solution; and a step of cleaning the nanocrystal quantum dots so as to remove impurities. The present invention replaces an organic ligand with a halogen material in the form of an inorganic substance, and thus can enable oxidation stability and effective injection of an electron/a hole and can be easily applied to QDEF technology and QD rail technology that are currently utilized in LCD component and material industries. Accordingly, it is expected that the present invention will have a great ripple effect.
机译:卤素表面取代方法技术领域本发明涉及用于纳米晶体量子点的表面稳定化的卤素表面取代方法,以及由此进行了卤素处理的纳米晶体量子点。该方法包括:制备其中有机配体结合到壳表面的纳米晶体量子点的步骤;通过使纳米晶体量子点与卤素溶液接触,用卤素材料取代有机配体的步骤;清洗纳米晶体量子点以去除杂质的步骤。本发明用无机物质形式的卤素材料代替有机配体,因此能够实现氧化稳定性和有效的电子/空穴注入,并且能够容易地应用于当前使用的QDEF技术和QD轨道技术。在LCD组件和材料行业。因此,预期本发明将具有很大的波纹效果。

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