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Horizontal furnace system and method for handling wafer boats, and wafer boat.
Horizontal furnace system and method for handling wafer boats, and wafer boat.
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机译：用于处理晶片舟的水平炉系统和方法，以及晶片舟。
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摘要
The horizontal furnace system comprises a furnace station comprising a plurality of processing tubes arranged above each other and a load station for loading wafer boats into and unloading wafer boats from said processing tubes, which load station is provided with a load station lift and a plurality of wafer boat loaders that are arranged above one another substantially in alignment with the processing tubes, each of which wafer boat loaders is configured for receiving wafer boats in a loading position and for transporting said wafer boats between the loading position and a processing tube, and which load station lift is arranged and configured to lift wafer boats onto and from the wafer boat loaders when positioned in their loading positions. The load station comprises a loading space configured for loading wafer boats onto said lift and unloading them from said lift. The load station further comprises at least one conditioning chamber configured for conditioning a wafer boat subsequent to transportation of said wafer boat out of a processing tube, which chamber comprises a door giving access to the conditioning chamber from the loading space. Furthermore, heat removal means are present that are configured for removal of heat from the at least one conditioning chamber out of the load station.
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