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METHOD FOR EXPOSURE AND DEVELOPMENT, SYSTEM FOR CONTROLLING EXPOSURE AND SYSTEM FOR EXPOSURE AND DEVELOPMENT

机译:曝光和显影的方法,曝光控制系统和曝光和显影系统

摘要

The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.
机译:本公开提供了一种用于曝光和显影的方法,一种用于控制曝光的系统以及一种用于曝光和显影的系统。用于曝光和显影的方法被配置为当基板的尺寸大于掩模的尺寸时对基板进行曝光和显影。该方法包括:分别通过掩模对基板的多个不同区域进行曝光和显影,其中,将多个不同区域进行拼接以形成需要曝光和显影的整个区域。

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