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METHOD FOR EXPOSURE AND DEVELOPMENT, SYSTEM FOR CONTROLLING EXPOSURE AND SYSTEM FOR EXPOSURE AND DEVELOPMENT
METHOD FOR EXPOSURE AND DEVELOPMENT, SYSTEM FOR CONTROLLING EXPOSURE AND SYSTEM FOR EXPOSURE AND DEVELOPMENT
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机译:曝光和显影的方法,曝光控制系统和曝光和显影系统
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摘要
The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.
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