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Methods and apparatus for modeling electromagnetic scattering properties of microscopic structures and methods and apparatus for reconstruction of microscopic structures

机译:用于对微观结构的电磁散射特性进行建模的方法和装置以及用于重建微观结构的方法和装置

摘要

Improved convergence in the volume-integral method (VIM) of calculating electromagnetic scattering properties of a structure is achieved by numerically solving a volume integral equation for a vector field, F, rather than the electric field, E. The vector field, F, may be related to the electric field, E, by a change of basis, and may be continuous at material boundaries where the electric field, E, has discontinuities. Convolutions of the vector field, F, are performed using convolution operators according the finite Laurent rule (that operate according to a finite discrete convolution), which allow for efficient matrix-vector products via ID and/or 2D FFTs (Fast Fourier Transforms). An invertible convolution-and-change-of-basis operator, C, is configured to transform the vector field, F, to the electric field, E, by performing a change of basis according to material and geometric properties of the periodic structure. After solving the volume integral for the vector field, F, an additional post-processing step may be used to obtain the electric field, E, from the vector field, F. The vector field, F, may be constructed from a combination of field components of the electric field, E, and the electric flux density, D, by using a normal-vector field, n, to filter out continuous components. The improved volume-integral method may be incorporated into a forward diffraction model in metrology tools for reconstructing an approximate structure of an object, for example to assess critical dimensions (CD) performance of a lithographic apparatus.
机译:通过对矢量场F而不是电场E的体积积分方程进行数值求解,可以实现计算结构的电磁散射特性的体积积分方法(VIM)的改进收敛性。矢量场F可以通过改变基础与电场E有关,并且在电场E具有不连续性的材料边界处可以是连续的。向量场F的卷积是根据有限Laurent规则(根据有限离散卷积进行操作)使用卷积运算符执行的,该运算符可以通过ID和/或2D FFT(快速傅立叶变换)实现有效的矩阵矢量乘积。可逆卷积和基础变化算子C被配置为通过根据周期性结构的材料和几何特性执行基础改变,将矢量场F转换为电场E。在求解了矢量场F的体积积分之后,可以使用附加的后处理步骤从矢量场F获得电场E。矢量场F可以由场的组合构造通过使用法向矢量场n来滤除电场E的分量和通量密度D,以滤除连续分量。可以将改进的体积积分方法并入计量工具中的前向衍射模型中,以重建物体的近似结构,例如,以评估光刻设备的临界尺寸(CD)性能。

著录项

  • 公开/公告号IL208105A

    专利类型

  • 公开/公告日2016-08-31

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号IL20100208105

  • 发明设计人

    申请日2010-09-13

  • 分类号G01Nnull/null;

  • 国家 IL

  • 入库时间 2022-08-21 14:26:05

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