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Nanostructured thin film, nanostructured transparent electrode, and method for producing nanostructured thin film

机译:纳米结构薄膜,纳米结构透明电极及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a nano structure thin film having nano size projections formed in a wide area with a high density, preferably used for the electrode of a photoelectric device, such as a solar cell and simplified even in manufacture, and a method for manufacturing the nano structure thin film.SOLUTION: A nano structure thin film 1 comprises: a base conductive layer 3 formed as a base on a substrate 2; and nano size projections 4 contacted with the base conductive layer 3 and formed of the same material as the base conductive layer 3. The nano size projections 4 comprises a nano structure thin film 1 formed with a density of 1×10to 3×10per 1 mmin an area of 1 mmor more. The shape of the nano size projection 4 includes: a conical shape, quadrangular prism shape and/or quadrangular pyramidal shape having a height H of 10 nm-150 m, a bottom surface diameter W of 1-500 nm and a ratio H/W of 1-1000; and a ball shape having a diameter of 1-500 nm at the tip of the nano size projection 4.
机译:解决的问题:提供一种具有在大范围内以高密度形成的具有纳米尺寸的突起的纳米结构薄膜,该薄膜优选地用于诸如太阳能电池的光电装置的电极,并且甚至在制造上也被简化。解决方案:纳米结构薄膜1包括:在基底2上形成为基底的基底导电层3;和在基底2上形成的基底导电层3。纳米突起4与基底导电层3接触并由与基底导电层3相同的材料形成。纳米突起4包括以每1mmin 1×10至3×10的密度形成的纳米结构薄膜1。 1毫米或更大的面积。纳米尺寸突起4的形状包括:高度H为10nm-150m,底表面直径W为1-500nm和比率H / W的圆锥形,四棱柱形和/或四棱锥形。 1-1000;在纳米尺寸突起4的尖端具有直径为1-500nm的球形。

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