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Method for producing self-assembled nanostructured thin film, nanostructured thin film
Method for producing self-assembled nanostructured thin film, nanostructured thin film
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机译：自组装纳米结构薄膜的制造方法，纳米结构薄膜
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摘要
PURPOSE: A method for manufacturing a nano structure thin film is provided to substitute an etch process for performing a patterning operation by using a bottom-up method. CONSTITUTION: A seed layer is formed by depositing a metal or a semiconductor thin film on a single crystal substrate or an amorphous substrate. A buffer layer is formed by depositing a metal causing an agglomeration effect on the seed layer. A pattern is formed by performing a thermal process at the temperature of 200-400C after forming an intermediate layer. A target layer is formed by depositing a dielectric, a semiconductor or the metal on the pattern.
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