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Electron beam irradiation device, a multi-electron-beam irradiation device, an electron beam exposure apparatus, and electron beam irradiation method

机译:电子束照射装置,多电子束照射装置,电子束曝光装置以及电子束照射方法

摘要

PROBLEM TO BE SOLVED: To provide a compact electron beam irradiation device in which throughput of an electron beam exposure device is enhanced.SOLUTION: The electron beam irradiation device outputing a plurality of electron beams includes a surface electron beam source having a plurality of electron emission parts which focuses electrons emitted, respectively, from the plurality of electron emission parts while accelerating and outputs as a plurality of electron beams, and an electron lens for irradiating an object with a drawing pattern formed of the plurality of electron beams output from the surface electron beam source with a predetermined magnification.
机译:解决的问题:提供一种紧凑的电子束照射装置,其中提高了电子束曝光装置的吞吐量。解决方案:输出多个电子束的电子束照射装置包括具有多个电子发射的表面电子束源。电子部件和电子透镜,该电子部件使从多个电子发射部件分别发射的电子同时聚焦并加速并作为多个电子束输出,该电子透镜用从表面电子输出的多个电子束形成的绘图图案照射物体。预定放大率的光束源。

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