首页> 外国专利> ELECTRON BEAM IRRADIATION DEVICE, MULTI ELECTRON BEAM IRRADIATION DEVICE, ELECTRON BEAM EXPOSURE SYSTEM, AND ELECTRON BEAM IRRADIATION METHOD

ELECTRON BEAM IRRADIATION DEVICE, MULTI ELECTRON BEAM IRRADIATION DEVICE, ELECTRON BEAM EXPOSURE SYSTEM, AND ELECTRON BEAM IRRADIATION METHOD

机译:电子束辐照设备,多电子束辐照设备,电子束曝光系统和电子束辐照方法

摘要

PROBLEM TO BE SOLVED: To provide a compact electron beam irradiation device in which throughput of an electron beam exposure device is enhanced.;SOLUTION: The electron beam irradiation device outputing a plurality of electron beams includes a surface electron beam source having a plurality of electron emission parts which focuses electrons emitted, respectively, from the plurality of electron emission parts while accelerating and outputs as a plurality of electron beams, and an electron lens for irradiating an object with a drawing pattern formed of the plurality of electron beams output from the surface electron beam source with a predetermined magnification.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种紧凑的电子束照射装置,其中提高了电子束曝光装置的吞吐量。解决方案:输出多个电子束的电子束照射装置包括具有多个电子的表面电子束源。分别使从多个电子发射部分发射的电子聚焦并同时加速并作为多个电子束输出的电子发射部分,以及用于用从表面输出的多个电子束形成的绘图图案照射物体的电子透镜。具有预定放大倍率的电子束源。;版权所有:(C)2013,JPO&INPIT

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