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System for generating a single process window model
System for generating a single process window model
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机译：用于生成单个过程窗口模型的系统
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摘要
PROBLEM TO BE SOLVED: To provide a system and a method for creating a focus-exposure model of a lithography process.;SOLUTION: The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter values that result in better accuracy and robustness of simulations at nominal process conditions, as well as the ability to predict lithographic performance at any point continuously throughout a complete process window area without a need for recalibration at different settings. With a smaller number of measurements required than the prior-art multiple-model calibration, the focus-exposure model provides more predictive and more robust model parameter values that can be used at any location in the process window.;COPYRIGHT: (C)2012,JPO&INPIT
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