首页> 外国专利> GRAIN DIAMETER MEASURING METHOD, GRAIN DIAMETER MEASURING APPARATUS AND GRAIN DIAMETER MEASURING PROGRAM

GRAIN DIAMETER MEASURING METHOD, GRAIN DIAMETER MEASURING APPARATUS AND GRAIN DIAMETER MEASURING PROGRAM

机译:粮食直径测量方法,粮食直径测量设备和粮食直径测量程序

摘要

PROBLEM TO BE SOLVED: To provide a grain diameter measuring method, a grain diameter measuring apparatus and a grain diameter measuring program, capable of reducing variation in measurement results obtained by measurers.;SOLUTION: A grain diameter measuring method includes: an image preparation step of preparing a processing target image in which a crystal structure of a predetermined region in a material is captured and a reference image used for exposing profile regions of crystal grains in the crystal structure; an image laminating step of laminating the reference image under the processing target image; a binarization step of performing binarization processing on a pixel value of each pixel constituting the processing target image, by taking a predetermined pixel value as a threshold; a transparent processing step of making transparent a region in the processing target image which corresponds to a region of a predetermined pixel value having a higher lower limit than the binarization threshold; a threshold adjustment step of performing binarization while adjusting the threshold so as to blacken a while outline region of the crystal grains contained in the crystal structure, which is exposed by laminating the processing target image and the reference image; and a grain diameter measuring step of measuring an average grain diameter of the crystal grains contained in the crystal structure by using a cutting method.;COPYRIGHT: (C)2016,JPO&INPIT
机译:要解决的问题:提供一种粒径测量方法,一种粒径测量设备和一种粒径测量程序,能够减少测量者获得的测量结果的差异。解决方案:一种粒径测量方法包括:图像准备步骤制备其中捕获材料中的预定区域的晶体结构的处理目标图像和用于暴露晶体结构中的晶粒的轮廓区域的参考图像;图像层压步骤,将参考图像层压在处理目标图像下;二值化步骤,将预定的像素值作为阈值,对构成处理对象图像的各像素的像素值进行二值化处理。透明处理步骤,其使处理对象图像中与预定像素值的区域相对应的区域的下限高于二值化阈值的区域透明。阈值调整步骤,在调整阈值的同时进行二值化,以使晶体结构中包含的晶粒的轮廓轮廓区域变黑,该区域通过层叠处理对象图像和基准图像而露出。晶粒直径测量步骤;以及使用切割方法测量晶体结构中所含晶粒的平均晶粒直径的方法。COPYRIGHT:(C)2016,JPO&INPIT

著录项

  • 公开/公告号JP2015203643A

    专利类型

  • 公开/公告日2015-11-16

    原文格式PDF

  • 申请/专利权人 JFE STEEL CORP;

    申请/专利号JP20140083698

  • 发明设计人 TAKASHITA TAKUYA;ONO MASAYUKI;

    申请日2014-04-15

  • 分类号G01N15/02;G06T7/60;

  • 国家 JP

  • 入库时间 2022-08-21 14:46:35

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号