ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING APPLICATIONS

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• 2. 用于化学机械抛光浆料应用的聚合物－二氧化硅分散剂的稳定化 [P] . 中国专利： CN101636465A . 2010-01-27
• 3. ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING APPLICATIONS [P] . 欧洲知识产权局专利： EP1966410B1 . 2018-12-26

  机译： 用于化学机械抛光应用的超纯胶体二氧化硅

• 4. Ultrapure colloidal silica for use in chemical mechanical polishing applications [P] . 美国专利： US8779011B2 . 2014-07-15

  机译： 超纯胶体二氧化硅，用于化学机械抛光应用

• 5. ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING APPLICATIONS [P] . 韩国专利： KR101214060B1 . 2012-12-20

  机译： 用于化学机械抛光应用的超纯胶体二氧化硅

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