首页> 外国专利> INLINE INSPECTION OF THE CONTACT BETWEEN CONDUCTIVE TRACES AND SUBSTRATE FOR HIDDEN DEFECTS USING WHITE LIGHT INTERFEROMETER WITH TILTED OBJECTIVE LENS

INLINE INSPECTION OF THE CONTACT BETWEEN CONDUCTIVE TRACES AND SUBSTRATE FOR HIDDEN DEFECTS USING WHITE LIGHT INTERFEROMETER WITH TILTED OBJECTIVE LENS

机译:使用带有倾斜目标透镜的白光干涉仪在线检查导电痕迹和基材之间的接触是否存在隐患

摘要

Embodiments include devices, systems and processes for using a white light interferometer (WLI) microscope with a tilted objective lens to perform in-line monitoring of both resist footing defects and conductive trace undercut defects. The defects may be detected at the interface between dry film resist (DFR) footings and conductive trace footing formed on insulating layer top surfaces of a packaging substrate. Such footing and undercut defects may other wise be considered “hidden defects”. Using the WLI microscope with a tilted objective lens provides a high-throughput and low cost metrology and tool for non-destructive, non-contact, in-line monitoring.
机译:实施例包括用于使用具有倾斜物镜的白光干涉仪(WLI)显微镜来对抗蚀剂立足缺陷和导电迹线底切缺陷两者进行在线监测的装置,系统和过程。可以在干膜抗蚀剂(DFR)基础和在封装基板的绝缘层顶表面上形成的导电迹线基础之间的界面处检测到缺陷。这种立足点和底切缺陷在其他方面也可以视为“隐藏缺陷”。使用带倾斜物镜的WLI显微镜可提供高通量,低成本的计量学和工具,用于无损,非接触式在线监测。

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