首页> 外国专利> PASSIVATION METHODS AND APPARATUS FOR ACHIEVING ULTRA-LOW SURFACE RECOMBINATION VELOCITIES FOR HIGH-EFFICIENCY SOLAR CELLS

PASSIVATION METHODS AND APPARATUS FOR ACHIEVING ULTRA-LOW SURFACE RECOMBINATION VELOCITIES FOR HIGH-EFFICIENCY SOLAR CELLS

机译:实现高效太阳能电池超低表面重组速度的钝化方法和装置

摘要

The disclosed subject matter provides a method and structure for obtaining ultra-low surface recombination velocities from highly efficient surface passivation in crystalline silicon substrate-based solar cells by utilizing a bi-layer passivation scheme which also works as an efficient ARC. The bi-layer passivation consists of a first thin layer of wet chemical oxide or a thin hydrogenated amorphous silicon layer. A second layer of amorphous hydrogenated silicon nitride film is deposited on top of the wet chemical oxide or amorphous silicon film. This deposition is then followed by annealing to further enhance the surface passivation.
机译:所公开的主题提供了一种方法和结构,该方法和结构用于通过利用双层钝化方案来从基于晶体硅基板的太阳能电池中的高效表面钝化中获得超低表面复合速度,该双层钝化方案还用作有效的ARC。双层钝化层由湿化学氧化物的第一薄层或氢化非晶硅薄层组成。第二层非晶氢化氮化硅膜沉积在湿化学氧化物或非晶硅膜的顶部。然后在该沉积之后进行退火以进一步增强表面钝化。

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