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GRANULAR EVAPORATION MATERIAL, METHOD FOR DEPOSITION OF EVAPORATED FILM, AND EVAPORATED FILM DEPOSITED FROM THE EVAPORATION MATERIAL

机译：粒状蒸发材料，蒸发膜的沉积方法以及从蒸发材料沉积的蒸发膜

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摘要

[Task] A granular deposition material for forming an oxide thin film at a high film-forming rate with a low level of splashing using a vacuum deposition method, a method of forming a deposited film, and a deposited film formed using the above deposition material are provided. [Means for Resolution] The granular deposition material of the invention is composed of a granular body which is formed through a granulation treatment of WO3 _x raw material powder (0X1) having a purity of 98% to less than 100%, and has an average grain diameter of 1 mm to 10 mm. In addition, in the method of forming the deposited film of the invention, the film is formed using the granular deposition material according to the first aspect through a resistance heating method, an EB method, or a reactive plasma deposition method.

机译：[任务]使用真空沉积法以高成膜速率和低飞溅水平形成氧化物薄膜的粒状沉积材料，沉积膜的形成方法以及使用上述沉积材料形成的沉积膜提供。 [用于解决的手段]本发明的颗粒状沉积材料由通过对WO3_x原料粉末（0 ＜X ＜1）的纯度为98％至小于100％的WO3_x原料粉末进行粒化处理而形成的粒状体构成，并且具有1mm至10mm的平均晶粒直径。另外，在本发明的沉积膜的形成方法中，使用根据第一方面的粒状沉积材料通过电阻加热法，EB法或反应性等离子体沉积法形成膜。

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公开/公告号IN2012CH04850A

专利类型
公开/公告日2014-04-18

原文格式PDF
申请/专利权人
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申请/专利号IN4850/CHE/2012
发明设计人 YOSHIDA YUKI;SAKURAI HIDEAKI;
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申请日2012-11-20
分类号C23C14/00;
国家 IN
入库时间 2022-08-21 15:57:46

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