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n-AlGaN THIN FILM AND ULTRAVIOLET LIGHT EMITTING DEVICE INCLUDING THE SAME

机译:n-AlGaN薄膜和包括其的紫外发光器件

摘要

An n-type aluminum gallium nitride (AlGaN) thin film and an ultraviolet light emitting device including the same. The ultraviolet light emitting device includes: an aluminum nitride (AlN) buffer layer on a substrate; and an n-type AlGaN layer, an active layer, a p-type AlGaN layer that are sequentially stacked on the AlN buffer layer. A silicon doping density of the n-type AlGaN layer increases with respect to an increasing vertical position of the n-AlGaN layer with reference to the AlN buffer layer.
机译:n型氮化铝镓(AlGaN)薄膜和包括该薄膜的紫外发光器件。该紫外线发射装置包括:在基板上的氮化铝(AlN)缓冲层;以及在基板上形成的氮化铝缓冲层。依次层叠在AlN缓冲层上的n型AlGaN层,活性层,p型AlGaN层。相对于n-AlGaN层相对于AlN缓冲层的垂直位置的增加,n型AlGaN层的硅掺杂密度增加。

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