Pattern formation process of the small features required for advanced pattern formation

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• 3. Process sequence for patterned hard mask thin film (RFP) formation that does not require photoresist or dry etching [P] . 日本专利： JP5559065B2 . 2014-07-23

  机译： 不需要光刻胶或干法刻蚀的图案化硬掩模薄膜（RFP）形成的工艺流程

• 4. Process sequence for patterned hard mask thin film (RFP) formation that does not require photoresist or dry etching [P] . 日本专利： JP2011520242A . 2011-07-14

  机译： 不需要光刻胶或干法刻蚀的图案化硬掩模薄膜（RFP）形成的工艺流程

• 5. Narrowed feature formation during a double patterning process [P] . 美国专利： US10249496B2 . 2019-04-02

  机译： 双重图案化过程中狭窄的特征形成

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