首页> 外国专利> Method for manufacturing e.g. quadratic solar cell, involves back etching portion of highly doped emitter region between portions of metallization structure by using metallization structure as etching mask

Method for manufacturing e.g. quadratic solar cell, involves back etching portion of highly doped emitter region between portions of metallization structure by using metallization structure as etching mask

机译:制造方法例如二次太阳能电池,涉及通过使用金属化结构作为蚀刻掩模对金属化结构的各部分之间的高掺杂发射极区进行反蚀刻

摘要

The method involves forming a metallization structure (112) on a highly doped emitter region (108) of a solar cell by screen printing, where the structure comprises contact fingers. A protecting layer (122) is formed on the structure by an electrochemical separation method, electrophoretic painting or coextrusion method to protect the structure during an etching process. A portion of the emitter region between portions of the structure is back etched by using the structure as an etching mask. A silicide contact is formed under the structure. The metallization structure is formed using coextrusion material such as polymer material in the coextrusion method. Independent claims are also included for the following: (1) a solar cell (2) a method for manufacturing a metallization structure.
机译:该方法包括通过丝网印刷在太阳能电池的高掺杂发射极区(108)上形成金属化结构(112),其中该结构包括接触指。通过电化学分离法,电泳涂漆或共挤出法在结构上形成保护层(122),以在蚀刻过程中保护结构。通过使用该结构作为蚀刻掩模来对该结构的各部分之间的发射极区的一部分进行蚀刻。在该结构下形成硅化物接触。在共挤出方法中,使用诸如聚合物材料的共挤出材料形成金属化结构。还包括以下方面的独立权利要求:(1)太阳能电池(2)一种金属化结构的制造方法。

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