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A method for controlling an electrochemical etching process and system with an electrochemical etching system
A method for controlling an electrochemical etching process and system with an electrochemical etching system
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机译：用电化学蚀刻系统控制电化学蚀刻过程的方法和系统
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摘要
A method with:Removal of material from metal structures, which are formed on a first substrate, by means of an electrochemical etching process, the in an electrochemical etching system is carried out, wherein the electrochemical etching system has a current source;Setting up of an electrical current flow between the substrate and an electrode arrangement during at least part of the electrochemical etching process with the use of the current source;Obtaining a status signal during the processing of the first substrate, wherein the status signal of a dynamic behavior of at least one installation parameter during the electrochemical etching process, whereby the at least one plant parameters at least one parameter, which is located on the electrical current flow, comprises;Estimating of a current plant status on the basis of the status signal by extracting a plurality of key from the status signal and comparing the key key with reference values, wherein the reference key values on the basis of electrochemical etching processes were obtained, the previously for other substrates were carried out as the first substrate; andRelease of the electrochemical etching system for machining a further substrate on the basis of the estimated installations status.
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