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LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE

机译:具有集成式流动均衡器的下衬套和改进的电导率

摘要

A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.
机译:等离子处理室具有带有集成式流量均衡器的下衬套。在蚀刻过程中,可能从处理室不均匀地吸入处理气体,这可能导致基板的不均匀蚀刻。集成的流量均衡器被配置为均衡经由下衬套从腔室排出的处理气体的流量。

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