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PLASMA PROCESSING APPARATUS CAPABLE OF REDUCING THE CHANGE OF THE ENERGY PICK OF AN ION ENERGY DISTRIBUTION FUNCTION AND A PLASMA PROCESSING METHOD THEREOF
PLASMA PROCESSING APPARATUS CAPABLE OF REDUCING THE CHANGE OF THE ENERGY PICK OF AN ION ENERGY DISTRIBUTION FUNCTION AND A PLASMA PROCESSING METHOD THEREOF
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机译：能够减少离子能量分布函数的能量选择变化的等离子处理装置及其等离子处理方法
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摘要
PURPOSE: A plasma processing apparatus capable of reducing the change of the energy pick of an IEDF(Ion Energy Distribution Function) and a plasma processing method thereof are provided to predict the waveform of a bias voltage generated on a wafer with high precision by using a result detected through a voltage detection head.;CONSTITUTION: An electromagnetic field supply unit supplies an electric field or a magnetic field in order to form plasma inside a vacuum process room(1). An exhaust unit is provided in order to exhaust the air inside the vacuum process room. A wafer(4) is provided on the mounting surface of the upper side of a vacuum container. A substrate stage(5) supports the wafer. A conductance control valve(18) variably controls the sized of the cross section area of a flow path within an exhaust path between a vacuum pump and an exhaust pipe. A cylindrical void(7) is formed to the upper direction of a micro wave permeable window(6). A shower plate(8) is formed on the position facing a substrate stage.;COPYRIGHT KIPO 2013
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