首页>
外国专利>
MEMS fabrication process base on SU-8 masking layers
MEMS fabrication process base on SU-8 masking layers
展开▼
机译：基于SU-8掩模层的MEMS制造工艺
展开▼
页面导航
摘要
著录项
相似文献
摘要
A novel fabrication process uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices. This technique allows the use of positive photomasks with negative resists, opening the door to an ability to create complementary mechanical structures without the fabrication delays and costs associated with having to obtain a negative photomask. In addition, whereas an SU-8 mask would normally be left in place after processing, a technique utilizing a positive photoresist as a release layer has been developed so that the SU-8 masking material can be removed post-etching.
展开▼
