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METHOD OF FORMING PHOTOMASKS AND PHOTOMASKS FORMED BY THE SAME
METHOD OF FORMING PHOTOMASKS AND PHOTOMASKS FORMED BY THE SAME
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机译：形成照片集的方法和由该照片集组成的照片集
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摘要
A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.
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