首页>
外国专利>
Method for dividing lithography pattern, lithography processing method including such dividing method, device manufacturing method, and mask manufactured by the above described split method
Method for dividing lithography pattern, lithography processing method including such dividing method, device manufacturing method, and mask manufactured by the above described split method
展开▼
机译：光刻图案的划分方法，包括该划分方法的光刻处理方法，器件制造方法以及通过上述划分方法制造的掩模
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a method of splitting a lithographic pattern into two sub-patterns.;SOLUTION: This method includes: generating test structures corresponding to structures of interest in the lithographic pattern; varying the test structures through a selected range of dimensions; simulating an image of the test structures; determining an image quality metric for the simulated image; analyzing the determined image quality metric to determine pitch ranges for which split improves the image quality metric and ranges for which split does not improve the image quality metric; and generating two sub-patterns in accordance with the determined pitch ranges.;COPYRIGHT: (C)2010,JPO&INPIT
展开▼
