首页> 外国专利> A METHOD OF MANUFACTURING A GRAYTONE MASK, THE GRAYTONE MASK AND A GRAYTONE MASK BLANK

A METHOD OF MANUFACTURING A GRAYTONE MASK, THE GRAYTONE MASK AND A GRAYTONE MASK BLANK

机译:一种制造灰色面膜,灰色面膜和灰色面膜毛坯的方法

摘要

PURPOSE: A method for manufacturing a gray tone mask and a gray tone mask blank are provided to suppress the progress of a side etching operation to a cross-section exposed light shielding film in case of etching a semi-transmitting film. CONSTITUTION: A gray tone mask includes patterns composed of a light shielding part, a transmitting part, and a semi-transmitting part. The gray tone mask includes light shielding film patterns(22a) and semi-transmitting film patterns(24a) on a transparent substrate. The patterns are formed by respectively etching a light shielding film(22) and a semi-transmitting film(24). The light shielding part is based on at least the light shielding film. The semi-transmitting part is based on the semi-transmitting film on the transparent substrate. The transmittance change of the semi-transmitting film in the exposing wavelength region from i line to g line is less than or equal to 1.5%.
机译:目的:提供一种用于制造灰色调掩模和灰色调掩模坯料的方法,以抑制在蚀刻半透射膜的情况下对截面暴露的遮光膜进行侧面蚀刻操作的进行。构成:灰色调掩膜包括由遮光部分,透射部分和半透射部分组成的图案。灰度掩模包括在透明基板上的遮光膜图案(22a)和半透射膜图案(24a)。通过分别蚀刻遮光膜(22)和半透射膜(24)来形成图案。遮光部至少基于遮光膜。半透射部分基于透明基板上的半透射膜。从i线到g线的曝光波长区域中的半透射膜的透射率变化小于或等于1.5%。

著录项

  • 公开/公告号KR20120042809A

    专利类型

  • 公开/公告日2012-05-03

    原文格式PDF

  • 申请/专利权人 HOYA CORPORATION;

    申请/专利号KR20120030420

  • 发明设计人 MITSUI MASARU;SANO MICHIAKI;

    申请日2012-03-26

  • 分类号G03F1/32;G03F1/58;

  • 国家 KR

  • 入库时间 2022-08-21 17:10:11

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