首页> 外国专利> System and method for correcting systematic parametric variations on integrated circuit chips in order to minimize circuit limited yield loss

System and method for correcting systematic parametric variations on integrated circuit chips in order to minimize circuit limited yield loss

机译:用于校正集成电路芯片上的系统参数变化以最小化电路限制的良率损失的系统和方法

摘要

Disclosed are a system and a method of correcting systematic, design-based, parametric variations on integrated circuit chips to minimize circuit limited yield loss. Processing information and a map of a chip are stored. The processing information can indicate an impact, on a given device parameter, of changes in a value for a specification associated with a given process step. The map can indicate regional variations in the device parameter (e.g., threshold voltage). Based on the processing information and using the map as a guide, different values for the specification are determined, each to be applied in a different region of the integrated circuit chip during the process step in order to offset the mapped regional parametric variations. A process tool can then be selectively controlled to ensure that during chip manufacturing the process step is performed accordingly and, thereby to ensure that the regional parametric variations are minimized.
机译:公开了一种校正集成电路芯片上的系统的,基于设计的参数变化以最小化电路受限的良率损失的系统和方法。存储处理信息和芯片图。处理信息可以指示与给定处理步骤相关联的规范的值的变化对给定设备参数的影响。该图可以指示设备参数(例如,阈值电压)中的区域变化。基于处理信息并使用地图作为指南,确定不同的规格值,每个值将在处理步骤中应用于集成电路芯片的不同区域,以抵消映射的区域参数变化。然后可以选择性地控制工艺工具,以确保在芯片制造期间相应地执行工艺步骤,从而确保使区域参数变化最小。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号