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METHOD OF MANUFACTURING SILICON THIN FILM, METHOD OF MANUFACTURING SILICON THIN-FILM PHOTOVOLTAIC CELL, SILICON THIN FILM, AND SILICON THIN-FILM PHOTOVOLTAIC CELL
METHOD OF MANUFACTURING SILICON THIN FILM, METHOD OF MANUFACTURING SILICON THIN-FILM PHOTOVOLTAIC CELL, SILICON THIN FILM, AND SILICON THIN-FILM PHOTOVOLTAIC CELL
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机译：硅薄膜的制造方法，硅薄膜光伏电池的制造方法，硅薄膜和硅薄膜光伏电池的制造方法
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摘要
Disclosed is a method of manufacturing a silicon thin film, a method of manufacturing a silicon thin-film photovoltaic cell, and a silicon thin film. There is provided a method of manufacturing a silicon thin film in a form in which an inert face formed by an exposed face of a silicon substrate and an inert layer is formed by selectively forming the inert layer on the silicon substrate in which growth of a silicon crystal is inactive for a raw material gas of the silicon crystal, and the silicon crystal is grown from the exposed face such that the silicon crystal covers the silicon substrate by supplying a raw material gas, of which a surface decomposition reaction on the silicon substrate is dominant, out of the raw material gas to the silicon substrate. By forming a width of the exposed face in a range of 0.001 μm to 1 μm, the silicon thin film is formed in a state that the silicon thin film can be peeled off from the silicon substrate.
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