首页> 外国专利> The characteristic x-ray which irradiates the electronic beam to the sample which is mounted in diagonal radiation electronic beam probe micro x-ray analysis manner and the program, and the diagonal

The characteristic x-ray which irradiates the electronic beam to the sample which is mounted in diagonal radiation electronic beam probe micro x-ray analysis manner and the program, and the diagonal

机译：将电子束照射到以对角线辐射电子束探针显微X射线分析方式和程序安装的样品上的特征X射线以及对角线

页面导航

摘要
著录项
相似文献

摘要

PPROBLEM TO BE SOLVED: To provide a method for correcting oblique of a sample surface occurring when a sample is set. PSOLUTION: In the oblique ejection electron beam probe micro X-ray analysis method, an electron beam is radiated to a sample mounted on a sample stage, the sample stage is tilted to an angle or smaller at which characteristic X-rays emitted from the inside of the sample is not detected due to the total reflection phenomenon on the sample surface, and an extraction angle of the characteristic X-rays is set, thereby selectively detecting only the characteristic X-rays emitted from the surface of the sample with an X-ray detector. The analysis method includes a step of determining the tilted angle of the sample surface with respect to a predetermined reference surface, and a step of setting the extraction angle of the characteristic X-rays by tilting the sample stage so as to offset the determined tilted angle. PCOPYRIGHT: (C)2009,JPO&INPIT

机译：

要解决的问题：提供一种用于校正放置样品时出现的样品表面倾斜的方法。

解决方案：在倾斜喷射电子束探针显微X射线分析方法中，电子束辐射到安装在样品台上的样品，样品台倾斜到一个角度或更小，以该角度发射特征X射线由于样品表面上的全反射现象，没有检测到来自样品内部的X射线，并且设置了特征X射线的提取角度，从而选择性地仅检测从样品表面发射的特征X射线。 X射线探测器。分析方法包括确定样品表面相对于预定参考表面的倾斜角度的步骤，以及通过倾斜样品台以抵消确定的倾斜角度来设置特征X射线的提取角度的步骤。。

版权：（C）2009，日本特许厅＆INPIT 展开▼

著录项

公开/公告号JP4887237B2

专利类型
公开/公告日2012-02-29

原文格式PDF
申请/专利权人シャープ株式会社;
展开▼

申请/专利号JP20070209856
发明设计人高岡宏樹;
展开▼

申请日2007-08-10
分类号G01N23/225;
国家 JP
入库时间 2022-08-21 17:36:13

相似文献

专利
外文文献
中文文献