首页> 外国专利> To diagonal radiation electronic beam probe micro x-ray analysis manner and the program, and the diagonal radiation electronic beam probe micro x-ray analytical instrument null sample which

To diagonal radiation electronic beam probe micro x-ray analysis manner and the program, and the diagonal radiation electronic beam probe micro x-ray analytical instrument null sample which

机译:以对角线辐射电子束探头的微观x射线分析方式和程序,以及对角线辐射电子束探头的微观x射线分析仪器的无效样本,得出

摘要

PPROBLEM TO BE SOLVED: To provide a method of analyzing an obliquely emitted electron beam probe micro-X-ray, which finds the correlation of the takeout angle of characteristic X rays with measuring depth. PSOLUTION: In the method of analyzing the obliquely emitted electron beam probe micro-X-ray, the takeout angle of characteristic X rays is set to an angle, which is not detected by the total reflection phenomenon of characteristic X ray emitted from the interior of a sample from the surface of the sample, or below to selectively detect on the characteristic X rays emitted from the surface layer of the sample. The sample is constituted of an under substrate as the interior of the sample and an upper substrate with a predetermined thickness as the surface layer of the sample, and the takeout angle of characteristic X rays emitted from the under substrate is gradually reduced from a predetermined angle to find out the disappearing angle of the characteristic X rays. The found-out disappearing angle is defined as a takeout angle capable of selectively analyzing only the constituent element of the upper substrate with the predetermined thickness. PCOPYRIGHT: (C)2008,JPO&INPIT
机译:

要解决的问题:提供一种分析倾斜发射的电子束探针微X射线的方法,该方法可以找到特征X射线的出射角与测量深度的相关性。

解决方案:在分析倾斜发射的电子束探针微X射线的方法中,特征X射线的出射角设置为一个角度,该角度不能由从中发射的特征X射线的全反射现象检测到从样品表面或下方的样品内部,以选择性地检测从样品表面层发出的特征X射线。样品由作为样品内部的下基板和作为样品的表层的预定厚度的上基板构成,并且从下基板发射的特征X射线的出射角从预定角度逐渐减小。找出特征X射线的消失角度。所发现的消失角被定义为能够选择性地仅分析具有预定厚度的上基板的构成元素的取出角。

版权:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP4728186B2

    专利类型

  • 公开/公告日2011-07-20

    原文格式PDF

  • 申请/专利权人 シャープ株式会社;

    申请/专利号JP20060198523

  • 发明设计人 高岡 宏樹;

    申请日2006-07-20

  • 分类号G01N23/225;

  • 国家 JP

  • 入库时间 2022-08-21 18:21:17

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