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Semiconductor Substrate Having AlGaN/GaN Heterostructure and Heterostructure Field Effect Transistor

机译:具有AlGaN / GaN异质结构和异质结构场效应晶体管的半导体衬底

摘要

PURPOSE: A semiconductor substrate having AlGaN/GaN hetero-structure and hetero-structure field effect transistor are provided to prevent the reduction of electronics within a channel due to thinning of PN junction and quantum well by forming a Si delta doping layer on a p-type potential barrier. CONSTITUTION: A p-type potential barrier layer(110) is laminated on a substrate(100). The p-type potential barrier comprises p type GaN layer or a p-type AlGaN layer. A non-doping GaN layer(140) is laminated on the p-type potential barrier. An AlGaN layer(150) is laminated on the non-doping GaN layer. An Si doped layer(130) is formed between the p-type potential barrier and the non-doping GaN layer.
机译:用途:提供具有AlGaN / GaN异质结构和异质结构场效应晶体管的半导体衬底,以通过在p-上形成Siδ掺杂层来防止由于PN结和量子阱变薄而导致沟道内电子的减少。类型势垒。组成:一个p型势垒层(110)层压在基板(100)上。 p型势垒包括p型GaN层或p型AlGaN层。在p型势垒上层叠非掺杂GaN层(140)。在非掺杂GaN层上层叠有AlGaN层(150)。在p型势垒和非掺杂GaN层之间形成Si掺杂层(130)。

著录项

  • 公开/公告号KR101041729B1

    专利类型

  • 公开/公告日2011-06-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090008721

  • 发明设计人 이동건;김용진;

    申请日2009-02-04

  • 分类号H01L29/737;H01L29/772;H01L21/335;

  • 国家 KR

  • 入库时间 2022-08-21 17:50:08

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