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SLURRY FOR POLISHING A PHASE CHANGE MATERIAL CAPABLE OF EMBODYING HIGH QUALITY POLISHING SURFACE BY MINIMIZING SURFACE DEFECTS SUCH AS SCRATCH AND A METHOD FOR PATTERNING POLISHING PHASE CHANGE MATERIAL USING THE SAME
SLURRY FOR POLISHING A PHASE CHANGE MATERIAL CAPABLE OF EMBODYING HIGH QUALITY POLISHING SURFACE BY MINIMIZING SURFACE DEFECTS SUCH AS SCRATCH AND A METHOD FOR PATTERNING POLISHING PHASE CHANGE MATERIAL USING THE SAME
PURPOSE: Slurry for polishing a phase change material is provided to polish the phase change material in which the state of the phase change material before the polishing is crystalline and to improve the polishing selectivity of the phase change material and insulating layer.;CONSTITUTION: Slurry for polishing a phase change material comprises abrasives, oxidant with the reference reduction potential larger than perchlorates, and ultrapure water. The phase change material is crystalline chalcogen binary alloy or chalcogen complex alloy. A method for manufacturing a phase change device comprises the steps of: preparing a substrate(110); forming a phase change material layer(130) with a crystalline phase on the substrate; and removing a part of the phase change material layer through a chemical mechanical polishing process using the slurry for polishing a phase change material.;COPYRIGHT KIPO 2011
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