首页> 外国专利> FABRICATION METHOD OF CROSS TYPE PHASE CHANGE DEVICE USING 3-DIMENSIONAL IMPRINT AND LIFT OFF PROCESS AND THE CROSS TYPE PHASE CHANGE DEVICE MANUFACTURED BY THE METHOD

FABRICATION METHOD OF CROSS TYPE PHASE CHANGE DEVICE USING 3-DIMENSIONAL IMPRINT AND LIFT OFF PROCESS AND THE CROSS TYPE PHASE CHANGE DEVICE MANUFACTURED BY THE METHOD

机译:利用三维印后升降过程的交叉相变装置的制造方法及由该方法制造的交叉相变装置

摘要

PURPOSE: A 3D imprint, a manufacturing method thereof, and a cross type phase change device thereof are provided to align a cross type phase change device by executing an imprint process using a stamp and executing a series patterning process for the manufacture of a device. CONSTITUTION: A resist is spread on a substrate including a first insulating body, a first conductive body for a lower electrode, and a second insulating body(S110). An edge, where the resist is removed by using the resist as a mask, is etched(S120). A resist in a center part is removed by using a reactive ion etching process. The second insulating body, which is exposed by the reactive ion etching process, is etched(S190).
机译:目的:提供3D压印,其制造方法及其十字型相变器件,以通过使用压模执行压印工艺并执行用于制造器件的串联图案化工艺来对准十字型相变器件。构成:在包括第一绝缘体,用于下部电极的第一导电体和第二绝缘体的基板上散布抗蚀剂(S110)。蚀刻通过使用抗蚀剂作为掩模去除抗蚀剂的边缘(S120)。通过使用反应离子蚀刻工艺去除中心部分的抗蚀剂。蚀刻通过反应离子蚀刻工艺暴露的第二绝缘体(S190)。

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