首页> 外国专利> Method for producing a semi-conductor crystal on base layer of floating zone process, comprises partially heating and melting a raw material crystal for forming melt zone under rotation of the raw material-crystal by induction heating coil

Method for producing a semi-conductor crystal on base layer of floating zone process, comprises partially heating and melting a raw material crystal for forming melt zone under rotation of the raw material-crystal by induction heating coil

机译:在浮区法的基层上制造半导体晶体的方法,包括部分加热和熔化原材料晶体,以通过感应加热线圈在原材料晶体的旋转下形成熔融区。

摘要

The method for the production of a semi-conductor crystal on base layer of a floating zone process, comprises partially heating and melting a raw material crystal (5) for forming a melt zone under rotation of the raw material-crystal by an induction heating coil (7), and moving the melt zone from an end portion to another end portion of the raw material crystal in order to let grow the semi-conductor crystal under rotation of the semi-conductor crystal. A rotation direction of the semi-conductor crystal is alternatively changed. The method for the production of a semi-conductor crystal on base layer of a floating zone process, comprises partially heating and melting a raw material crystal (5) for forming a melt zone under rotation of the raw material-crystal by an induction heating coil (7), and moving the melt zone from an end portion to another end portion of the raw material crystal in order to let grow the semi-conductor crystal under rotation of the semi-conductor crystal. A rotation direction of the semi-conductor crystal is alternatively changed and the rotation direction and/or the number of revolutions of the raw material crystal is changed during the growth of the semiconductor crystals in order to let grow the semi-conductor crystal. The rotation direction and/or the number of revolutions of the raw material crystal is synchronically changed with the change of the rotation direction of the semiconductor crystals. The rotation direction of the raw material crystal is changed in opposite direction to the rotation direction of the semiconductor crystal, when the rotation direction of the raw material crystal is changed in order to let grow the semi-conductor crystal. The rotation direction of the raw-material crystal and the semiconductor crystal are opposite to each other. The number of revolutions of the raw material crystal is adjusted so that it is greater than the number of revolutions of the raw material, when the raw material crystal and the semi-conductor crystal have same rotation direction. The number of revolutions of the raw material crystal is adjusted so that it is equal or smaller than the number of revolutions of the semi-conductor crystals. A diameter of the produced semiconductor-crystal is adjusted to 150 mm or more. An independent claim is included for a device for the production of a semi-conductor crystal on the base layer of a floating zone process.
机译:用于在浮区工艺的基层上制造半导体晶体的方法包括:部分加热并熔化原材料晶体(5),以通过感应加热线圈在原材料晶体的旋转下形成熔化区。 (7)将熔融区域从原料结晶的一端部移至另一端部,以便在半导体结晶的旋转下使半导体结晶生长。半导体晶体的旋转方向被交替地改变。用于在浮区工艺的基层上制造半导体晶体的方法包括:部分加热并熔化原材料晶体(5),以通过感应加热线圈在原材料晶体的旋转下形成熔化区。 (7)将熔融区域从原料结晶的一端部移至另一端部,以便在半导体结晶的旋转下使半导体结晶生长。为了使半导体晶体生长,在半导体晶体的生长期间交替改变半导体晶体的旋转方向,并且改变原材料晶体的旋转方向和/或转数。原料晶体的旋转方向和/或转数与半导体晶体的旋转方向的改变同步地改变。当为了使半导体晶体生长而改变原料晶体的旋转方向时,原料晶体的旋转方向在与半导体晶体的旋转方向相反的方向上改变。原料晶体和半导体晶体的旋转方向彼此相反。当原料晶体和半导体晶体具有相同的旋转方向时,调节原料晶体的旋转数,使得其大于原料的旋转数。调节原料晶体的转数,以使其等于或小于半导体晶体的转数。将所制造的半导体晶体的直径调整为150mm以上。对于在浮区工艺的基层上用于制造半导体晶体的装置包括独立的权利要求。

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