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APPARATUS AND A METHOD FOR PROVIDING A PHOTORESIST AND AN ANTIREFLECTIVE MATERIAL, CAPABLE OF INTEGRATING A PHOTORESIST COATING UNIT AND AN ANTI-GLARE MATERIAL COATING UNIT
APPARATUS AND A METHOD FOR PROVIDING A PHOTORESIST AND AN ANTIREFLECTIVE MATERIAL, CAPABLE OF INTEGRATING A PHOTORESIST COATING UNIT AND AN ANTI-GLARE MATERIAL COATING UNIT
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机译：提供能够集成光致抗蚀剂涂层单元和抗眩光材料涂层单元的光致抗蚀剂和抗反射材料的装置和方法
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摘要
PURPOSE: An apparatus and a method for providing a photoresist and an antireflective material are provided to reduce a process time by supplying an anti-glare material and photoresist through a one supply unit.;CONSTITUTION: A robot arm(100) moves on a wafer(W). A first nozzle(71) and a second nozzle(73) are formed in the bottom surface of the robot arm. First nozzle and second nozzle are arranged at the center of the wafer. The first nozzle sprays anti-reflection material on the wafer to form a reflection barrier. The second nozzle sprays the photoresist on the surface of wafer to form a photo resist film.;COPYRIGHT KIPO 2010
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