首页> 外国专利> METHOD OF IDENTIFYING A CAUSE OF HAZE GENERATION OF A PHOTOMASK, CAPABLE OF PRECISELY CLASSIFYING CAUSE OF HAZE GENERATION

METHOD OF IDENTIFYING A CAUSE OF HAZE GENERATION OF A PHOTOMASK, CAPABLE OF PRECISELY CLASSIFYING CAUSE OF HAZE GENERATION

机译:识别光罩产生雾的原因的方法,可以精确地分类产生雾的原因

摘要

PURPOSE: A method of identifying a cause of haze generation of a photomask is provided to evaluate the haze generation cause source and prevent the haze generation by evaluating the organic material according to the status of haze generation and classifying as the haze generation cause source or the non haze generation source.;CONSTITUTION: The organic materials produced in the photomask manufacture process are extracted(S10). The organic contaminant is attached to the surface of photomask(S20). The accelerated light is irradiated on the organic contaminant on the surface of the photomask(S30). The status of haze generation is inspected by measuring the organic contaminant irradiated by the light(S40).;COPYRIGHT KIPO 2010
机译:目的:提供一种识别光掩模的雾度产生原因的方法,以评估雾度产生原因并通过根据雾度产生的状态评估有机材料并将其分类为雾度产生原因或原因来防止雾度产生。非雾霾产生源。;构成:提取在光掩模制造过程中产生的有机材料(S10)。有机污染物附着在光掩模的表面上(S20)。加速的光照射在光掩模表面上的有机污染物上(S30)。通过测量光线照射下的有机污染物来检查烟雾产生的状态(S40)。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100076677A

    专利类型

  • 公开/公告日2010-07-06

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20080134803

  • 发明设计人 LEE JUN SIK;

    申请日2008-12-26

  • 分类号H01L21/027;H01L21/66;G01N21/59;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:20

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