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Aqueous Solution for Chemical Polishing and Deburring and Process for Polishing and Deburring A Part made of Pure Nickel or Nickel-200 Therein
Aqueous Solution for Chemical Polishing and Deburring and Process for Polishing and Deburring A Part made of Pure Nickel or Nickel-200 Therein
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机译：化学抛光和去毛刺的水溶液以及抛光和去毛刺的过程其中纯镍或Nickel-200制成的零件
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摘要
An aqueous solution for polishing and deburring includes pure water; carboxylic acid of 200 gram per liter to 300 gram per liter; sulfuric acid ions of 200 gram per liter to 500 gram per liter; phosphoric acid ions of 100 gram per liter to 300 gram per liter; and nitric acid ions of 50 gram per liter to 200 gram per liter. Also, a process for polishing and deburring a part made of pure nickel or nickel-200 in the solution includes removing oily substance from the part; washing the part by water; pouring the solution into a bath and submerging the part in the solution so that the part is brought into contact with the solution; neutralizing the solution remained on the surface of the part to prevent the part from oxidizing; and drying the part to obtain a finished part.
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