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首页> 美国卫生研究院文献>Materials >KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal
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KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal

机译：KDP油包水型微乳液用于KDP晶体的超精密化学机械抛光

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摘要

A novel functional KH2PO4 (KDP) aqueous solution-in-oil (KDP aq/O) microemulsion system for KDP crystal ultra-precision chemical-mechanical polishing (CMP) was prepared. The system, which consisted of decanol, Triton X-100, and KH2PO4 aqueous solution, was available at room temperature. The functional KDP aq/O microemulsion system was systematically studied and applied as polishing solution to KDP CMP technology. In this study, a controlled deliquescent mechanism was proposed for KDP polishing with the KDP aq/O microemulsion. KDP aqueous solution, the chemical etchant in the polishing process, was caged into the micelles in the microemulsion, leading to a limitation of the reaction between the KDP crystal and KDP aqueous solution only if the microemulsion was deformed under the effect of the external force. Based on the interface reaction dynamics, KDP aqueous solutions with different concentrations (cKDP) were applied to replace water in the traditional water-in-oil (W/O) microemulsion. The practicability of the controlled deliquescent mechanism was proved by the decreasing material removal rate (MRR) with the increasing of the cKDP. As a result, the corrosion pits on the KDP surface were avoided to some degree. Moreover, the roughnesses of KDP with KDP aq/O microemulsion (cKDP was changed from 10 mM to 100 mM) as polishing solutions were smaller than that with the W/O microemulsion. The smallest surface root-mean-square roughness of 1.5 nm was obtained at a 30 mmol/L KDP aq solution, because of the most appropriate deliquescent rate and MRR.
机译：制备了用于KDP晶体超精密化学机械抛光（CMP）的新型功能性KH2PO4（KDP）油包水溶液（KDP aq / O）微乳液体系。该系统由癸醇，Triton X-100和KH2PO4水溶液组成，可在室温下使用。系统地研究了功能性KDP aq / O微乳液体系，并将其用作KDP CMP技术的抛光液。在这项研究中，提出了使用KDP aq / O微乳液进行KDP抛光的受控潮解机理。 KDP水溶液（抛光过程中的化学蚀刻剂）被笼罩在微乳液中的胶束中，仅当微乳液在外力作用下变形时，KDP晶体和KDP水溶液之间的反应才会受到限制。基于界面反应动力学，将不同浓度的KDP水溶液（cKDP）用于代替传统的油包水（W / O）微乳液中的水。随着cKDP的增加，材料去除率（MRR）的降低证明了潮解机制的实用性。结果，在某种程度上避免了KDP表面上的腐蚀坑。此外，当抛光液比使用W / O微乳液的KDP aq / O微乳液（cKDP从10 mM变为100 mM）时，KDP的粗糙度较小。由于最合适的潮解率和MRR，在30 mmol / L KDP水溶液中获得的最小表面均方根粗糙度为1.5 nm。

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