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Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources
Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources
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机译:倾斜镜面法向入射收集器系统,用于光源,尤其是EUV等离子体放电源
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摘要
There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a first aperture angle via a first beam path, and reflects the EUV light at a second aperture angle along a second beam path. The first aperture angle is larger than or substantially equal to the second aperture angle. The second mirror receives the EUV light from the first mirror at the second aperture angle. The collector is an oblique mirror type normal incidence mirror collector system.
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