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首页> 外文期刊>EPJ Web of Conferences >Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions
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Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions

机译：基于带多重电荷的锡和氙离子的非平衡等离子体非均匀流动中基于微波放电的EUV光源建模

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A competitive alternative is microwave discharge supported by submillimeter wave radiation of modern high power gyrotron s. Duration of gyrotron pulses is much lon g er (50 μs to CW) and provided power is much higher (up to 1 MW) than those for lasers in use. These allow to support strongly radiating di s- charge in stationary mode . Moreover, microwave heat ing leads to non equilib rium plasma with high - energy electrons and as a consequence high rates of electron impact ionization and excitation. Two co n- cept s of such EUV light sources were developed in IAP: based on tin plasma flow propagating through the open magnetic trap and freel y expan ding flow of xenon plasma [5, 6]. Both concepts are tested in proof of principle experiments, but detailed theoretical study is required to explore phys ical constrains and prosp ects for these concepts . This study is in focus of present commun ication .
机译：一种有竞争力的替代方法是由现代大功率回旋管的亚毫米波辐射支持的微波放电。回旋脉冲的持续时间长得多（到CW为50μs），并且提供的功率比所用激光器的功率高得多（高达1 MW）。这些允许在固定模式下支持强烈辐射的电荷。此外，微波加热导致具有高能电子的非平衡等离子体，因此电子撞击电离和激发的速率很高。在IAP中开发了两种这样的EUV光源的概念：基于通过开放磁阱传播的锡等离子体流和氙等离子体的自由膨胀流[5，6]。这两个概念均在原理实验证明中进行了测试，但需要进行详细的理论研究，以探索这些概念的物理约束和条件。这项研究是当前通信的重点。

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