Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources

Akira SASAKI; Katsunobu NISHIHARA; Atsushi SUNAHARA; Hiroyuki FURUKAWA; Takeshi NISHIKAWA; Fumihiro KOIKE

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Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources

机译：等离子体中多电荷离子的原子过程建模及其在EUV光源研究中的应用

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Atomic processes of multiple-charged ions of high-Z elements from tin to dysprosium are investigated for their application to light sources for extreme-ultra-violet (EUV) lithography. Modeling of these ions in plasmas, including tungsten, which is being considered for use as a divertor and wall material in the fusion devices, is discussed. Atomic spectra become very complex in the case of low-charged ions below Pd-like ions, which calls for a new atomic code for calculating the energy levels and rate coefficients of collisional and radiative processes. The collisional radiative model is validated through code comparison workshop activities. An alternative method for investigating the formation of the non-uniform structure of the plasmas is also presented.

机译：研究了从锡到的高Z元素多电荷离子的原子过程，并将其应用于极紫外（EUV）光刻光源。讨论了在包括钨在内的等离子体中对这些离子的建模，该模型被认为在聚变设备中用作分流器和壁材料。在低电荷离子低于类Pd离子的情况下，原子光谱变得非常复杂，这要求使用新的原子代码来计算碰撞和辐射过程的能级和速率系数。碰撞辐射模型通过代码比较研讨会活动进行了验证。还提出了研究等离子体不均匀结构形成的另一种方法。

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《Plasma and Fusion Research》 |2011年第10期|共1页
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Akira SASAKI; Katsunobu NISHIHARA; Atsushi SUNAHARA; Hiroyuki FURUKAWA; Takeshi NISHIKAWA; Fumihiro KOIKE;
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中图分类等离子体物理学;
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1. Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions [J] . I.S. Abramov, E.D. Gospodchikov, A.G. Shalashov EPJ Web of Conferences . 2018,第2期

机译：基于带多重电荷的锡和氙离子的非平衡等离子体非均匀流动中基于微波放电的EUV光源建模
2. Atomic processes and equation of state of high Z plasmas for EUV sources and their effects on the spatial and temporal evolution of the plasmas [J] . Akira Sasaki, Atushi Sunahara, Hiroyuki Furukawa, Journal of Physics: Conference Series . 2016,第1期

机译：EUV源的高Z等离子体的原子过程和状态方程及其对等离子体的时空演化的影响
3. Detailed Elaboration and General Model of the Electron Treatment of Surfaces of Charged Plasmoids (from Atomic Nuclei to White Dwarves, Neutron Stars, and Galactic Cores): Self-Condensation (Self-Constriction) and Classification of Charged Plasma Structures-Plasmoids Part 1. General Analysis of the Convective Cumulative-Dissipative Processes Caused by the Violation of Neutrality: Metastable Charged Plasmoids and Plasma Lenses [J] . Ph. I. Vysikaylo Surface Engineering and Applied Electrochemistry . 2012,第1期

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4. Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source [C] . Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Conference on extreme ultraviolet lithography;EUV . 2010

机译：LPP和LA-DPP EUV源中原子和等离子体过程的建模
5. Radiation studies of the tin-doped microscopic droplet laser plasma light source specific to EUV lithography. [D] . Koay, Chiew-Seng. 2006

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7. Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources [O] . Akira SASAKI, Katsunobu NISHIHARA, Atsushi SUNAHARA, 2011

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8. Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications. [R] . 2007

机译：高度集成模型作为用于模拟EUV应用中激光产生的等离子体的流体动力学，辐射传输和热传导现象的仪器。

Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources

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