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METHOD FOR PROJECTING WAFER PRODUCT OVERLAY ERROR AND WAFER PRODUCT CRITICAL DIMENSION
METHOD FOR PROJECTING WAFER PRODUCT OVERLAY ERROR AND WAFER PRODUCT CRITICAL DIMENSION
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机译：晶圆产品叠加误差和晶圆产品关键尺寸的投影方法
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摘要
A method for projecting wafer product overlay error of the present invention is disclosed, the steps of the method comprises:(a) sample equipment overlay error data, equipment condition data, and actual wafer product overlay error data; (b) establish a neural network, the equipment overlay error data and the equipment condition data are inputs of the neural network, the generated output of the neural network is projected wafer product overlay error data, and the actual wafer product overlay error data is the target output of the neural network; and (c) set a mean square error target, train the neural network continuously until the mean square error of the neural network is no longer bigger than the mean square error target. Additionally a method for projecting wafer product critical dimension is also presented in the present invention.
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