首页> 外国专利> Electron beam focus control device, attitude control system of the electron beam irradiation head, electron beam focus control method and electron beam irradiation head attitude control method of

Electron beam focus control device, attitude control system of the electron beam irradiation head, electron beam focus control method and electron beam irradiation head attitude control method of

机译：电子束聚焦控制装置，电子束照射头的姿态控制系统，电子束聚焦控制方法和电子束照射头的姿态控制方法

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摘要

PPROBLEM TO BE SOLVED: To control changes in the attitude of a static floating pad so as to keep the attitude of the hydrostatic floating pad and to avoid contact with an original disk even when the static floating pad passes between a turntable and a focus stage. PSOLUTION: The attitude stabilization controlling system is equipped with: a primary vacuum groove negative pressure sensor 41 and a secondary vacuum groove negative pressure sensor 42 to detect changes in the negative pressure in a primary vacuum groove 32 and a secondary vacuum groove 33 of the static floating pad 6 caused by the movement of an original disk 11 in the radial direction accompanying electron beam focus control; a negative pressure supply part 44 to render attitude stabilizing grooves 31-1 to 31-4 into vacuum by the negative pressure; and a attitude stabilization controlling part 43 to render the attitude stabilizing grooves 31-1 to 31-4 into vacuum by the negative pressure by the negative pressure supply part 44 when changes in the negative pressure in the primary vacuum groove 32 and in the secondary vacuum groove 33 are detected by the primary vacuum groove negative pressure sensor 41 and by the secondary vacuum groove negative pressure sensor 42. PCOPYRIGHT: (C)2005,JPO&NCIPI

机译：

要解决的问题：控制静态浮垫的姿态变化，以保持静压浮垫的姿态，并且即使静态浮垫在转盘和滑架之间通过，也避免与原始磁盘接触。重点阶段。

解决方案：姿态稳定控制系统配备：主真空槽负压传感器41和副真空槽负压传感器42，用于检测主真空槽32和副真空槽33中负压的变化。静态浮动垫6是由原始盘11在径向上伴随电子束聚焦控制的运动引起的;负压供给部44通过该负压使姿势稳定槽31-1〜31-4成为真空。姿势稳定控制部43，当一次真空槽32和二次真空的负压变化时，通过负压供给部44的负压使姿势稳定槽31-1〜31-4成为真空。初级真空槽负压传感器41和次级真空槽负压传感器42检测沟槽33。

版权：（C）2005，JPO＆NCIPI 展开▼

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公开/公告号JP4379020B2

专利类型
公开/公告日2009-12-09

原文格式PDF
申请/专利权人ソニー株式会社;
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申请/专利号JP20030193052
发明设计人佐々木純;
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申请日2003-07-07
分类号G03F7/20;G11B7/26;
国家 JP
入库时间 2022-08-21 18:56:55

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