首页> 外国专利> ELECTRON BEAM FOCUS CONTROLLING APPARATUS, ATTITUDE CONTROLLING APPARATUS FOR ELECTRON BEAM IRRADIATION HEAD, METHOD FOR CONTROLLING ELECTRON BEAM FOCUS AND METHOD FOR CONTROLLING ATTITUDE OF ELECTRON BEAM IRRADIATION HEAD

ELECTRON BEAM FOCUS CONTROLLING APPARATUS, ATTITUDE CONTROLLING APPARATUS FOR ELECTRON BEAM IRRADIATION HEAD, METHOD FOR CONTROLLING ELECTRON BEAM FOCUS AND METHOD FOR CONTROLLING ATTITUDE OF ELECTRON BEAM IRRADIATION HEAD

机译:电子束焦点控制装置,电子束照射头的姿态控制装置,电子束焦点的控制方法和电子束照射头的姿态控制方法

摘要

PROBLEM TO BE SOLVED: To control changes in the attitude of a static floating pad so as to keep the attitude of the hydrostatic floating pad and to avoid contact with an original disk even when the static floating pad passes between a turntable and a focus stage.;SOLUTION: The attitude stabilization controlling system is equipped with: a primary vacuum groove negative pressure sensor 41 and a secondary vacuum groove negative pressure sensor 42 to detect changes in the negative pressure in a primary vacuum groove 32 and a secondary vacuum groove 33 of the static floating pad 6 caused by the movement of an original disk 11 in the radial direction accompanying electron beam focus control; a negative pressure supply part 44 to render attitude stabilizing grooves 31-1 to 31-4 into vacuum by the negative pressure; and a attitude stabilization controlling part 43 to render the attitude stabilizing grooves 31-1 to 31-4 into vacuum by the negative pressure by the negative pressure supply part 44 when changes in the negative pressure in the primary vacuum groove 32 and in the secondary vacuum groove 33 are detected by the primary vacuum groove negative pressure sensor 41 and by the secondary vacuum groove negative pressure sensor 42.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:控制静态浮垫的姿态变化,以保持静压浮垫的姿态,即使静态浮垫在转盘和聚焦台之间通过,也要避免与原始磁盘接触。 ;解决方案:姿态稳定控制系统配有:主真空槽负压传感器41和次级真空槽负压传感器42,用于检测传感器的主真空槽32和副真空槽33中的负压变化。静态浮动垫6是由原始盘11在径向方向上伴随电子束聚焦控制的运动而引起的;负压供给部44通过该负压使姿势稳定槽31-1〜31-4成为真空。姿势稳定控制部43,当一次真空槽32和二次真空的负压变化时,通过负压供给部44的负压使姿势稳定槽31-1〜31-4成为真空。初级真空槽负压传感器41和次级真空槽负压传感器42检测沟槽33。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005031147A

    专利类型

  • 公开/公告日2005-02-03

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20030193052

  • 发明设计人 SASAKI JUN;

    申请日2003-07-07

  • 分类号G03F7/20;G11B7/26;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:44

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