首页> 外国专利> Mask for use in exposing system, has light-shielding area comprising photonic crystals with lattice constant, where ratio of lattice constant to wavelength of light is specific value within band gap of photonic crystal

Mask for use in exposing system, has light-shielding area comprising photonic crystals with lattice constant, where ratio of lattice constant to wavelength of light is specific value within band gap of photonic crystal

机译:用于曝光系统的掩模具有遮光区域,该遮光区域包括具有晶格常数的光子晶体,其中,晶格常数与光的波长之比是在光子晶体的带隙内的比值。

摘要

The mask (2) has a light-shielding area (3) for shielding light e.g. extreme UV light, and a light passing area (6) allowing the light to pass through it. The light-shielding area comprises a set of photonic crystals with a lattice constant, where ratio of the lattice constant to a wavelength of the light is a specific value within a band gap of the photonic crystal. The photonic crystal comprises a set of photonic crystal cells, where each photonic crystal cell has a surface (200) receiving the light, and two dielectrics. An independent claim is also included for a method for designing a mask.
机译:掩模(2)具有用于遮挡例如玻璃的光的遮光区域(3)。极紫外光,以及允许光线穿过的透光区域(6)。遮光区域包括一组具有晶格常数的光子晶体,其中,晶格常数与光的波长的比是在光子晶体的带隙内的特定值。该光子晶体包括一组光子晶体单元,其中每个光子晶体单元具有接收光的表面(200)和两个电介质。还包括用于设计掩模的方法的独立权利要求。

著录项

  • 公开/公告号DE102009008429A1

    专利类型

  • 公开/公告日2009-09-10

    原文格式PDF

  • 申请/专利权人 NANYA TECHNOLOGY CORPORATION;

    申请/专利号DE20091008429

  • 发明设计人 LIN CHIA-WEI;HUANG TENG-YEN;

    申请日2009-02-11

  • 分类号G03F1;G02F1/01;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:03

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