METHOD OF ENHANCING CLEAR FIELD PHASE SHIFT MASKS WITH BORDER REGIONS AROUND PHASE 0 AND PHASE 180 REGIONS

• 1. 在0相与180相区域周围形成边界区域以增强透明电场相移位光罩的方法 [P] . 中国专利： CN1285009C . 2006.11.15
• 2. 在0相与180相区域周围形成边界区域以增强透明电场相移位光罩的方法 [P] . 中国专利： CN1602448A . 2005-03-30
• 3. METHOD FOR ENHANCING POSITIVE (CLEAR FIELD) PHASE SHIFT MASK (TRANSPARENT PHASE SHIFT MASK WITH OPAQUE APERTURE) WITH BORDER REGIONS AROUND PHASE 0 REGION AND PHASE 180 REGIONS [P] . 日本专利： JP2009288818A . 2009-12-10

  机译： 在0相区和180相区的边界区域增强正（透明场）相移掩模（具有不透明孔径的透明相移掩模）的方法

• 4. METHOD OF ENHANCING CLEAR FIELD PHASE SHIFT MASKS WITH BORDER REGIONS AROUND PHASE 0 AND PHASE 180 REGIONS [P] . 欧洲知识产权局专利： EP1454190B1 . 2008-05-21

  机译： 增强0相和180相周围边界区域的清晰磁场相移掩模的方法

• 5. METHOD OF ENHANCING CLEAR FIELD PHASE SHIFT MASKS WITH BORDER REGIONS AROUND PHASE 0 AND PHASE 180 REGIONS [P] . 韩国专利： KR20040074081A . 2004-08-21

  机译： 增强0相和180相周围边界区域的清晰磁场相移掩模的方法

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