ETCHING AND CLEANING SOLUTION FOR GLASS IN LIQUID CRYSTAL DISPLAY DEVICE AND ETCHING METHOD USING THE SAME

• 1. 蚀刻溶液组合物和使用该蚀刻溶液组合物的湿蚀刻方法 [P] . 中国专利： CN104039925B . 2016.05.11
• 2. 蚀刻溶液组合物和使用该蚀刻溶液组合物的湿蚀刻方法 [P] . 中国专利： CN104039925A . 2014-09-10
• 3. ETCHING SOLUTION FOR PATTERNING INDIUM TIN OXIDE, AND MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME ETCHING SOLUTION [P] . 日本专利： JP2003051496A . 2003-02-21

  机译： 用于电镀氧化铟锡的蚀刻溶液以及使用该蚀刻溶液的液晶显示装置的制造方法

• 4. Automatic Etching Device of Glass for TFT (Thin Film Transistor) LCD (Liquid Crystal Displayer) and Etching Method [P] . 韩国专利： KR19980030458A . 1998-07-25

  机译： TFT（薄膜晶体管）LCD（液晶显示器）玻璃的自动刻蚀装置及刻蚀方法

• 5. METHOD OF MANUFACTURING A LIQUID CRYSTAL DISPLAY DEVICE, CAPABLE OF EASILY PROTECTING A PART WHERE ETCHING IS NOT NECESSARY FROM ETCHING SOLUTION [P] . 韩国专利： KR20100025219A . 2010-03-09

  机译： 制造液态液晶显示装置的方法，该技术可容易地保护不需要蚀刻解决方案的零件，而无需蚀刻解决方案

• 1. A one-pot method for controlled synthesis and selective etching of organic-inorganic hybrid perovskite crystals [J] . Yu Hou, Mengjiong Chen, Hongwei Qiao, 能源化学：英文版 . 2019,第006期
• 2. A one-pot method for controlled synthesis and selective etching of organic-inorganic hybrid perovskite crystals [J] . Yu Hou, Mengjiong Chen, Hongwei Qiao, 天然气化学（英文版） . 2019,第006期
• 3. Silicon Deep Etching Techniques for MEMS Devices [J] . WU Ying, OU Yi-hong, JIANG Yong-qing, 半导体光子学与技术（英文版） . 2003,第004期
• 4. Regeneration of cerium(IV) in different spent chromium-etching solutions collected from thin-film transistor liquid crystal display manufacturing factories [J] . Huang Kuo-Lin, Chen Te-San, Tsai Ren-Wei, Clean technologies and environmental policy . 2016,第4期
• 5. Low voltage transflective blue-phase liquid crystal display with a non-uniform etching substrate [J] . Jian Wang, Jiang-Lin Mao, Hao-Xiang Fan, 中国物理：英文版 . 2016,第009期
• 6. Patent Issued for Apparatus for Etching Substrate and Fabrication Line for Fabricating Liquid Crystal Display Using the Same [J] . Robotics and Machine Learning . 2012,第45期
• 7. Glass Materials for Display Devices Fabricated by A New Etching Process [C] . Kenichi Yakushiji, Yoichi Shibuya, Hisao Kuroda, The Ninth International Display Workshops (IDW '02) Dec 4-6, 2002 Hiroshima, Japan . 2002
• 8. Reactive ion etching of crystalline silicon carbide and fabrication of silicon carbide devices. [D] . Yih, Pei Haur. 1994
• 9. Deposition of Durable Micro Copper Patterns into Glass by Combining Laser-Induced Backside Wet Etching and Laser-Induced Chemical Liquid Phase Deposition Methods [O] . Jae Min Seo, Kui-Kam Kwon, Ki Young Song, 2020
• 10. Etching Mechanism of Pb-Free Glasses in Acid Solution for Barrier Ribs in Plasma Display Panel [O] . Jae-myung Kim, Hyung-sun Kim 2016
• 11. Research Report 142 STUDIES OF ICE ETCHING I Application of Thermal Etching to the Study of Surface Abrasion in Ice Crystals [R] . Daisuke Kuroiwa 1965

• 1. Terahertz Wave Generation via Nonlinear Parametric Process from iε/i-GaSe Single Crystals Grown by Liquid Phase Solution Method [J] . Kyosuke Saito ,Yuki Nagai ,Kunihiko Yamamoto . 光学与光子学期刊（英文） . 2014,第8期
• 2. Etching and Micro-Topographical Studies of Barium Oxalate Crystals Grown in Agar Gel [J] . Paresh V. Dalal ,Kishor B. Saraf . 结晶过程及技术期刊（英文） . 2011,第1期
• 3. 从高含氯量的电子线路板蚀刻废液中回收氯化亚铜新方法 [C] . 王爱民 ,沙钝 ,马晓玲 . 上海市化学化工学会2005年度学术年会 . 2005
• 4. 单晶硅在四甲基氢氧化铵溶液中的蚀刻行为研究 [A] . 陈远东 . 2019