首页> 外国专利> PLASMA GENERATOR SYSTEM AND A METHOD FOR FORMING THE PLASMA, CAPABLE OF REDUCING A MAINTENANCE COST OF THE SYSTEM

PLASMA GENERATOR SYSTEM AND A METHOD FOR FORMING THE PLASMA, CAPABLE OF REDUCING A MAINTENANCE COST OF THE SYSTEM

机译:等离子发生器系统和形成等离子的方法,能够降低系统的维护成本

摘要

PURPOSE: A plasma generator system and a method for forming the plasma are provided to reduce the sputtering and ion impact of the system component.;CONSTITUTION: A plasma generator system(100) includes a container(104), a single coil(108), an energy source(110), and a capacitor(158). The single coil is arranged around the container. The single coil includes a first end(136), a second end(138), a first winding(140) and a second winding(142). The energy source is directly connected to the first end. The capacitor is directly connected to the second end. The first winding is extended from the first end. The second winding is integrated with the first winding and is extended to the second end.;COPYRIGHT KIPO 2010
机译:目的:提供等离子体产生器系统和形成等离子体的方法,以减少系统部件的溅射和离子冲击。;组成:等离子体产生器系统(100)包括容器(104),单个线圈(108) ,能源(110)和电容器(158)。单个线圈布置在容器周围。单个线圈包括第一端(136),第二端(138),第一绕组(140)和第二绕组(142)。能源直接连接到第一端。电容器直接连接到第二端。第一绕组从第一端延伸。第二绕组与第一绕组集成在一起,并延伸到第二端。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20090105783A

    专利类型

  • 公开/公告日2009-10-07

    原文格式PDF

  • 申请/专利权人 NOVELLUS SYSTEMS INC.;

    申请/专利号KR20080087815

  • 发明设计人 CHEUNG DAVID;QIU HUATAN;KOTHNUR PRASHANTH;

    申请日2008-09-05

  • 分类号H05H1/24;H05H1/30;H05H1/34;

  • 国家 KR

  • 入库时间 2022-08-21 19:12:29

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号